Electron Beam Lithography

JEOL JBX-6000FS/E
This dedicated electron beam lithography system writes patterns with a 25 nm resolution and a 60 nm overlay and stitching accuracy, using a 5 nm beam. The tool can accept a variety of sample sizes from small pieces (5x5 mm2) to full 6” wafers.

    Example of 30nm metal (Au:Cr) deposited by lift off for advanced metrology

    qualification using the writing capability of JEOL 6000 FS.